By Anthony C. Jones, Michael L. Hitchman
Chemical Vapour Deposition (CVD) comprises the deposition of skinny sturdy motion pictures from chemical precursors within the vapour part, and includes a number of deposition options, together with more than a few thermal tactics, plasma superior CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). the advance of CVD know-how owes greatly to collaboration among diversified clinical disciplines similar to chemistry, physics, fabrics technology, engineering and microelectronics, and the booklet of this e-book will advertise and stimulate endured discussion among scientists from those varied examine components. The e-book is likely one of the such a lot entire overviews ever written at the key facets of chemical vapour deposition methods and it's extra entire, technically certain and updated than different books on CVD. The contributing authors are all practicing CVD technologists and are best overseas specialists within the box of CVD. It offers a logical and revolutionary evaluation of a number of the elements of CVD tactics. uncomplicated recommendations, corresponding to some of the varieties of CVD approaches, the layout of CVD reactors, response modelling and CVD precursor chemistry are coated within the first few chapters. Then follows an in depth description of using a range CVD innovations to deposit quite a lot of fabrics, together with semiconductors, metals, steel oxides and nitrides, protecting coatings and useful coatings on glass. eventually and uniquely, for a technical quantity, business and advertisement facets of CVD also are mentioned including attainable destiny tendencies, that's an strange, yet extremely important point of the ebook. The e-book has been written with CVD practitioners in brain, resembling the chemist who needs to profit extra approximately CVD tactics, or the CVD technologist who needs to realize an elevated wisdom of precursor chemistry. the quantity will end up rather priceless to those that have lately entered the sector, and it'll additionally make a worthy contribution to chemistry and fabrics technology lecture classes at undergraduate and postgraduate point.
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Additional resources for Chemical Vapour Deposition: Precursors, Processes and Applications Edition
A. C. Jones and P. O’Brien, Chapter 2 in CVD of Compound Semiconductors, VCH, Weinheim, 1997. 74. A. A. Efremov, V. A. Federov and E. E. Grinberg, translated from Vysokchiste Veschestra, No. 3, May-June 1998, pp 5-43, Plenum Publishing Corp. 1989. 75. E. E. Grinberg and A. A. Efremov, Electron. Tekh. Ser. , 1975, 7, 62. 76. V. G. Makarenko, V. A. Federov and A. A. Efremov, Electron. Tekh. Ser. , 1974, 11, 71. 77. A. A. Efremov, E. E. Grinberg, Yu M. Fetisov, USSR Pat. 546,617, Byull. , 1977, 6.
S. Taylor, P. A. Williams, J. L. Roberts, A. C. Jones and P. R. Chalker, Electron. , 2002, 38, 1285. 97. K. Kukli, M. Ritala, M. Leskela¨, T. Sajavaara, J. Keinonen, A. C. Jones and J. L. Roberts, Chem. , 2003, 15, 1722. 98. R. O’Kane, J. Gaskell, A. C. Jones, P. R. Chalker, K. Black, M. Werner, P. Taechakumput, S. Taylor, P. N. Heys and R. Odedra, Chem. Vap. Deposition, 2007, 13, 609. CHAPTER 2 CVD Reactors and Delivery System Technology SUSAN P. 1 CVD System Overview From the engineering perspective, the CVD system is essentially a ‘‘molecular scale’’ manufacturing facility.
K. Kukli, M. Ritala, M. Leskela¨, T. Sajavaara, J. Keinonen, A. C. Jones and J. L. Roberts, Chem. , 2003, 15, 1722. 98. R. O’Kane, J. Gaskell, A. C. Jones, P. R. Chalker, K. Black, M. Werner, P. Taechakumput, S. Taylor, P. N. Heys and R. Odedra, Chem. Vap. Deposition, 2007, 13, 609. CHAPTER 2 CVD Reactors and Delivery System Technology SUSAN P. 1 CVD System Overview From the engineering perspective, the CVD system is essentially a ‘‘molecular scale’’ manufacturing facility. Just like any factory, the production rate is determined by the slowest step in the manufacturing process.